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RotaQ ES
Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd), and carbon evaporation.
The TurboQ E is an automated and versatile turbo pumped coater offering unparalleled ease of use. Recommended for sample preparation for the examination of specimens using Electron Microscopy (EM). Suitable for use with FE-SEM, FEG-SEM and FIB-SEM.
The TurboQ E is an automatic carbon rod coater designed for TEM applications including for Carbon coating for elemental analysis and coating of TEM grids.
Venting gas: Nitrogen supply for purging should be N4.8 (Zero Grade) 99.998% purity capable of supplying 0.5 bar (minimum 0.3 bar and maximum 1 bar) with nominal flow rate of 3 ± 0.2 litre/min for 60 s. The system is supplied with 3m plastic tubing 3 mm I.D. x 6 mm O.D. from quick release connectors to be fitted to a pressure regulator or plant supply.
Pumping gas: Argon supply for sputtering should be N4.8 (Zero Grade) 99.998% purity capable of supplying 0.5 bar (minimum 0.3 bar and maximum 1 bar) with nominal flow rate of 3 ± 0.2 litre/min for a 4-minute maximum sputter cycle time (some instruments may have specially extended sputter cycles). The system is supplied with 3m plastic tubing 3 mm I.D. x 6 mm O.D. from quick release connectors on the rear of the unit. It is the customer’s responsibility to connect from this hose to the pressure regulator set at approximately 10psi, from gas bottle or plant supply. Typically, a system will use 0.2 litres of Argon for a 4-minute sputter cycle.
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Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd), and carbon evaporation.
Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd), and carbon evaporation.
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for high resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd).
Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd).
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, designed for high resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation. Modular design enables vacuum chamber to be mounted into a glovebox.
Rotary pumped coater suitable for carbon evaporation.
Entry-level coater, equipped with rotary pump, suitable for sputter coating non-oxidising metals (Au, Au/Pd and Ag).
Rotary pumped coater suitable for carbon evaporation.
Turbo pumped coater suitable for carbon evaporation, designed for high resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Turbo pumped coater suitable for carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.
Dual sputter head turbo pumped coater with large chamber ideal for coating large samples up to 200 mm with two metals. Suitable for sputtering oxidising and non-oxidising metals.
Triple sputter head turbo pumped coater with large chamber ideal for coating large samples up to 200 mm with one metal. Suitable for sputtering oxidising and non-oxidising metals.
Turbo pumped coater with large chamber ideal for coating large samples up to 150 mm Ø. Suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation.