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TurboQ ES

Product configuratorMore information
Q-Series
Q-Series
Q-Series
Q-Series

Key Features

  • High vacuum instrument for ultra-high-resolution EM up to and beyond 200k 
  • Ultra fine grain size for high-resolution analysis
  • Combined system capable of sputter and carbon coating  
  • Rapid cycle time for maximum sample throughput
  • Tilt stage design giving uniform coating of complex 3D structures  
  • Film Thickness Monitor (FTM) to control deposition of coating  
  • Intuitive and responsive touchscreen colour panel design
  • Multi-colour LED visual status indicator offering process updates 
  • Pre-set recipes for standard protocols resulting in sample reproducibility  
  • Customizable recipes for tailored applications 
  • Easy and quick set-up of profiles  
  • Multiple stage options based on application need

Details

The TurboQ ES is an automated and versatile turbo pumped coater offering unparalleled ease of use. Recommended for sample preparation for the examination of specimens using Electron Microscopy (EM). Suitable for use with FE-SEM, FEG-SEM and FIB-SEM.

The TurboQ ES is a combined system is capable of both sputtering and carbon coating. The deposition head inserts can be swapped to allow for Metal evaporation/aperture cleaning and Glow Discharge.

Site requirements

Venting gas: Nitrogen supply for purging should be N4.8 (Zero Grade) 99.998% purity capable of supplying 0.5 bar (minimum 0.3 bar and maximum 1 bar) with nominal flow rate of 3 ± 0.2 litre/min for 60 s. The system is supplied with 3m plastic tubing 3 mm I.D. x 6 mm O.D. from quick release connectors to be fitted to a pressure regulator or plant supply.

Pumping gas: Argon supply for sputtering should be N4.8 (Zero Grade) 99.998% purity capable of supplying 0.5 bar (minimum 0.3 bar and maximum 1 bar) with nominal flow rate of 3 ± 0.2 litre/min for a 4-minute maximum sputter cycle time (some instruments may have specially extended sputter cycles). The system is supplied with 3m plastic tubing 3 mm I.D. x 6 mm O.D. from quick release connectors on the rear of the unit. It is the customer’s responsibility to connect from this hose to the pressure regulator set at approximately 10psi, from gas bottle or plant supply. Typically, a system will use 0.2 litres of Argon for a 4-minute sputter cycle.

  • Ultra-high-resolution magnification SEM and FIB-SEM
  • Coating of noble and oxidizing metals
  • Carbon coating for elemental analysis and carbon coating of TEM grids
  • Unit Weight 38 Kg (ES model)
  • Packed weight 54 Kg (ES model)
  • Instrument size 440 mm (W) x 556 mm (H) x 551 mm (D)
  • Instrument size with chamber open 440 mm (W) x 860 mm (H) x 551 mm (D)
  • Specimen stage  Short stage 65 mm (H) from chamber base, 50 mm Ø diameter Tall stage: 145 mm (H) from chamber base, 50 mm Ø diameter
  • Chamber size: 150 mm Ø diameter, 220 mm (H)
  • Ultimate vacuum 1x10-6 mbar
  • Operational vacuum 5x10-6 mbar
  • Vacuum gauge range 1000 to x10-9 mbar
  • User interface Touch screen colour display
  • Supply voltage 100V – 240V Sputter Coater (TurboQ S and TurboQ ES)
  • Sputter target Target Disc style, 57 mm Ø diameter x 0.3 mm (thickness) (chromium supplied as standard)
  • Specimen Stage 50 mm Ø diameter rotating stage
  • Deposition Current 1-150 mA
  • Deposition Rate 0.1-20 nm/min (e.g. for Au)
  • Sputter Timer 0-60 min
  • Evaporation Coater (TurboQ E and TurboQ ES)
  • Evaporation current (rod) 5-75 A (dependent on process)
  • Outgas current 1-40 A
  • Carbon source 3.2 mm rods or carbon fibre

More information

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